MOCVD, CVD, & ALD Precursors

City Chemical services the semiconductor industry by manufacturing the highest quality precursor chemicals, used in producing thin films for Micro/Nano Electronics. These include CVD (Chemical Layer Deposition), ALD (Atomic Layer Deposition), and MOCVD (Metalorganic CVD).

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  Benzyltrichlorosilane
  CAS #: 770-10-5

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  Cyclopentadienyltrimethylsilane
  CAS #: 3559-74-8

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  Diethylsilane
  CAS #: 542-91-6

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  Hexachlorodisilane
  CAS #: 13465-77-5

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  Hexachlorodisiloxane
  CAS #: 14986-21-1

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  Hexamethyldisilane
  CAS #: 1450-14-2

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  Silicon Acetate
  CAS #: 562-90-3

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  Silicon Bromide, SiBr4
  CAS #: 7789-66-4

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  Silicon Iodide, (Powder or Granular Form) Sil4
  CAS #: 13465-84-4

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  Tetraallysilane
  CAS #: 1112-66-9

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  Tetraethylsilane
  CAS #: 631-36-7

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  Tetrakis(diethylamino)titanium
  CAS #: 4419-47-0

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  Tetrakis(diethylamino)zirconium
  CAS #: 13801-49-5

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  Tributylsilane
  CAS #: 998-41-4

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  Triethylsilane
  CAS #: 617-86-7

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  Trisilylamine
  CAS #:

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