Chemical Vapor Deposition

• Immediate Availability

• Custom Packaging

• Custom Synthesis

• Full Technical Services

City Chemical offers the best prices and highest purity of Chemical Vapor Deposition (CVD) used by today's leading global semiconductor and electronic industry.

Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors, which react on the substrate surface to produce the desired deposit.

Benzyltrichlorosilane

770-10-5 C7H7CI3Si MW 225.57

Cyclopentadienyltrimethylsilane

3559-74-8 C8H14S FW 138.28, Moisture sensitive.

Diethylsilane

542-91-6 C4HIOSi MW 88.2

Hexachlorodisilane

13465-77-5 CI6Si2 MW 268.89 Clear colorless liquid. Synonym: HCDS Stable, but reacts violently with water. Moisture sensitive. May be shock sensitive. Incompatible with water, moisture, acids, strong bases, oxidizing agents, alcohols.

Hexamethyldisilane

1450-14-2 C6HI8Si2 MW 146.40 Clear colorless liquid. Synonym: HMD

Silicon acetate

562-90-3 C8H12O8Si MW 264.26 Synonyms: Silicon tetraacetate, Tetraacetoxysilane.

Silicon Iodide

13465-84-4 Sil4 FW 535.68 Synonym: Silicon (IV) iodide.

Silcon tetrabromide

7789-66-4 SiBr4 FW 347.68 Synonym: Silicon (IV) bromide.

Tetraallylsilane

1112-66-9 H2C=CH-CH24Si FW 192.38

Tetraethylsilane

631-36-7 C8H20Si FW 144.33

Tributylsilane

998-41-4 C4H93SiH FW 199.42

Triethylsilane

617-86-7 C2H53SiH FW 116.28

Trisilylamine

13862-16-3 H9NSi3 MW 107.34 Synonym: Silanamine

City Chemical - Your ResponseAble Source for
Chemical Vapor Deposition Chemicals and More!