Used in semiconductor coatings, oxide films, and thin film optical applications, Tantalum ethoxide precursor is used to deposit ultra-thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition (ALD) and chemical vapor deposition (CVD) methods
|Chemical Synonym||Tantalum (V) Ethoxide, Pentaethyl tantalate, Tantalum pentaethoxide|
|Appearance/Form||Clear, colorless liquid|
|Purity||99.99% Clear Colorless to Pale Yellow Liquid|
|Flash Point||30 °C (86 °F) in a closed cup|
|Handling and Storage||Precautions for safe handling
Moisture Sensitive, Packed under Argon or Nitrogen.
Avoid inhalation of vapor or mist.
Keep away from sources of ignition - No smoking. Take measures to prevent the buildup of electrostatic charge. For precautions see section 2.2.
Conditions for safe storage, including any incompatibilities
Keep container tightly closed in a dry and well-ventilated place. Containers which are opened must be carefully resealed and kept upright to prevent leakage.
Moisture sensitive. Handle and store under inert gas.
|MP||21 °C (70 °F)|
|Storage||Keep container tightly closed in a dry and well-ventilated place.|
|Transport Information||Proper Shipping Name: Corrosive liquids, flammable, n.o.s. (Tantalum Ethoxide)
Class: 8 (3)
Hazard Label: Corrosive Liquid
Packing Group: II